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1 Ergebnisse
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Defect Generation and Severity Comparison of Negative Bias ..:
Chen, Shuang-Yuan
;
Tu, Chia-Hao
Japanese Journal of Applied Physics. 49 (2010) 4S - p. 04DC26 , 2010
Link:
https://doi.org/10.1143/jjap.49.04dc26
RT Journal T1 <Title>Defect Generation and Severity Comparison of Negative Bias Temperature Stress-Induced Degradation on 90 nm p-Channel Metal–Oxide–Semiconductor Field-Effect Transistors with Different Oxide Thicknesses</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.49.04dc26&Exemplar=1&LAN=DE A1 Chen, Shuang-Yuan A1 Tu, Chia-Hao PB IOP Publishing YR 2010 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 49 IS 4S SP 04DC26 LK http://dx.doi.org/https://doi.org/10.1143/jjap.49.04dc26 DO https://doi.org/10.1143/jjap.49.04dc26 SF ELIB - SuUB Bremen
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