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1 Ergebnisse
1
Integration of Photo-Patternable Low-κ Material into Advanc..:
Lin, Qinghuang
;
Nelson, Alshakim
;
Chen, Shyng-Tsong
...
Japanese Journal of Applied Physics. 49 (2010) 5S2 - p. 05FB02 , 2010
Link:
https://doi.org/10.1143/jjap.49.05fb02
RT Journal T1
Integration of Photo-Patternable Low-κ Material into Advanced Cu Back-End-Of-The-Line
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.49.05fb02&Exemplar=1&LAN=DE A1 Lin, Qinghuang A1 Nelson, Alshakim A1 Chen, Shyng-Tsong A1 Brock, Philip A1 Cohen, Stephan A. A1 Davis, Blake A1 Kaplan, Richard A1 Kwong, Ranee A1 Liniger, Eric A1 Neumayer, Debra A1 Patel, Jyotica A1 Shobha, Hosadurga A1 Sooriyakumaran, Ratnam A1 Purushothaman, Sampath A1 Miller, Robert A1 Spooner, Terry A1 Wisnieff, Robert PB IOP Publishing YR 2010 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 49 IS 5S2 SP 05FB02 LK http://dx.doi.org/https://doi.org/10.1143/jjap.49.05fb02 DO https://doi.org/10.1143/jjap.49.05fb02 SF ELIB - SuUB Bremen
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