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1 Ergebnisse
1
High-Etching-Selectivity Barrier SiC (k<3.5) Film for 32-nm..:
Nakahira, Junya
;
Nagano, Shuji
;
Gawase, Akifumi
...
Japanese Journal of Applied Physics. 49 (2010) 5S2 - p. 05FD04 , 2010
Link:
https://doi.org/10.1143/jjap.49.05fd04
RT Journal T1
High-Etching-Selectivity Barrier SiC (k<3.5) Film for 32-nm-Node Copper/Low-k Interconnects
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.49.05fd04&Exemplar=1&LAN=DE A1 Nakahira, Junya A1 Nagano, Shuji A1 Gawase, Akifumi A1 Ohashi, Yoshi A1 Shimizu, Hideharu A1 Chikaki, Shinichi A1 Oda, Noriaki A1 Kondo, Seiichi A1 Hasaka, Satoshi A1 Saito, Shuichi PB IOP Publishing YR 2010 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 49 IS 5S2 SP 05FD04 LK http://dx.doi.org/https://doi.org/10.1143/jjap.49.05fd04 DO https://doi.org/10.1143/jjap.49.05fd04 SF ELIB - SuUB Bremen
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