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1 Ergebnisse
1
Double Junction Tunnel Using Si Nanocrystalline Layer for N..:
Ohba, Ryuji
;
Mitani, Yuichiro
;
Sugiyama, Naoharu
..
Japanese Journal of Applied Physics. 50 (2011) 4R - p. 041302 , 2011
Link:
https://doi.org/10.1143/jjap.50.041302
RT Journal T1
Double Junction Tunnel Using Si Nanocrystalline Layer for Nonvolatile Memory Devices
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.50.041302&Exemplar=1&LAN=DE A1 Ohba, Ryuji A1 Mitani, Yuichiro A1 Sugiyama, Naoharu A1 Matsumoto, Mari A1 Fujita, Shinobu PB IOP Publishing YR 2011 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 50 IS 4R SP 041302 LK http://dx.doi.org/https://doi.org/10.1143/jjap.50.041302 DO https://doi.org/10.1143/jjap.50.041302 SF ELIB - SuUB Bremen
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