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1 Ergebnisse
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Metal-Assisted Chemical Etching of Silicon Using Oxygen as ..:
Yae, Shinji
;
Morii, Yuma
;
Enomoto, Masato
..
ECS Transactions. 50 (2013) 37 - p. 31-36 , 2013
Link:
https://doi.org/10.1149/05037.0031ecst
RT Journal T1
Metal-Assisted Chemical Etching of Silicon Using Oxygen as an Oxidizing Agent: Influence of HF Concentration on Etching Rate and Pore Morphology
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_05037.0031ecst&Exemplar=1&LAN=DE A1 Yae, Shinji A1 Morii, Yuma A1 Enomoto, Masato A1 Fukumuro, Naoki A1 Matsuda, Hitoshi PB The Electrochemical Society YR 2013 SN 1938-5862 SN 1938-6737 JF ECS Transactions VO 50 IS 37 SP 31 OP 36 LK http://dx.doi.org/https://doi.org/10.1149/05037.0031ecst DO https://doi.org/10.1149/05037.0031ecst SF ELIB - SuUB Bremen
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