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1 Ergebnisse
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Effect of the Interfacial SiO2 Layer on High-k Gate Stacks:
Chen, Yong
;
He, Yonggen
;
Liu, Hailong
...
ECS Transactions. 52 (2013) 1 - p. 657-663 , 2013
Link:
https://doi.org/10.1149/05201.0657ecst
RT Journal T1
Effect of the Interfacial SiO2 Layer on High-k Gate Stacks
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_05201.0657ecst&Exemplar=1&LAN=DE A1 Chen, Yong A1 He, Yonggen A1 Liu, Hailong A1 Yu, Guobin A1 Liu, Jialei A1 Hong, Zhongshan A1 Ni, Jinhua A1 Wu, Jingang PB The Electrochemical Society YR 2013 SN 1938-5862 SN 1938-6737 JF ECS Transactions VO 52 IS 1 SP 657 OP 663 LK http://dx.doi.org/https://doi.org/10.1149/05201.0657ecst DO https://doi.org/10.1149/05201.0657ecst SF ELIB - SuUB Bremen
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