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1 Ergebnisse
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(Invited) Processing Technologies for Advanced Ge Devices:
Loo, Roger
;
Hikavyy, Andriy Yakovitch
;
Witters, Liesbeth
...
ECS Transactions. 75 (2016) 8 - p. 491-503 , 2016
Link:
https://doi.org/10.1149/07508.0491ecst
RT Journal T1
(Invited) Processing Technologies for Advanced Ge Devices
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_07508.0491ecst&Exemplar=1&LAN=DE A1 Loo, Roger A1 Hikavyy, Andriy Yakovitch A1 Witters, Liesbeth A1 Schulze, Andreas A1 Arimura, Hiroaki A1 Cott, Daire A1 Mitard, Jerome A1 Porret, Clement A1 Mertens, Hans A1 Ryan, Paul A1 Wall, John A1 Matney, Kevin A1 Wormington, Matthew A1 Favia, Paola A1 Richard, Olivier A1 Bender, Hugo A1 Horiguchi, Naoto A1 Collaert, Nadine A1 Thean, Aaron PB The Electrochemical Society YR 2016 SN 1938-5862 SN 1938-6737 JF ECS Transactions VO 75 IS 8 SP 491 OP 503 LK http://dx.doi.org/https://doi.org/10.1149/07508.0491ecst DO https://doi.org/10.1149/07508.0491ecst SF ELIB - SuUB Bremen
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