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1 Ergebnisse
1
Highly Reliable Nickel Silicide Formation with a Zr Capping..:
Lee, Tsung Lin
;
Lee, Jam Wem
;
Lee, Mei Chi
..
Electrochemical and Solid-State Letters. 6 (2003) 5 - p. G66 , 2003
Link:
https://doi.org/10.1149/1.1563093
RT Journal T1 <Title>Highly Reliable Nickel Silicide Formation with a Zr Capping Layer</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.1563093&Exemplar=1&LAN=DE A1 Lee, Tsung Lin A1 Lee, Jam Wem A1 Lee, Mei Chi A1 Lei, Tan Fu A1 Lee, Chung Len PB The Electrochemical Society YR 2003 SN 1099-0062 JF Electrochemical and Solid-State Letters VO 6 IS 5 SP G66 LK http://dx.doi.org/https://doi.org/10.1149/1.1563093 DO https://doi.org/10.1149/1.1563093 SF ELIB - SuUB Bremen
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