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1 Ergebnisse
1
Characterization of Temperature Dependence for HfO[sub 2] G..:
Wang, Jer Chyi
;
Shie, De Ching
;
Lei, Tan Fu
.
Electrochemical and Solid-State Letters. 6 (2003) 10 - p. F34 , 2003
Link:
https://doi.org/10.1149/1.1605272
RT Journal T1
Characterization of Temperature Dependence for HfO[sub 2] Gate Dielectrics Treated in NH[sub 3] Plasma
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.1605272&Exemplar=1&LAN=DE A1 Wang, Jer Chyi A1 Shie, De Ching A1 Lei, Tan Fu A1 Lee, Chung Len PB The Electrochemical Society YR 2003 SN 1099-0062 JF Electrochemical and Solid-State Letters VO 6 IS 10 SP F34 LK http://dx.doi.org/https://doi.org/10.1149/1.1605272 DO https://doi.org/10.1149/1.1605272 SF ELIB - SuUB Bremen
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