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Modeling and Characterization of Gas‐Phase Etching of Therm..:
Lee, Chun Su
;
Baek, Jong Tae
;
Yoo, Hyung Joun
.
Journal of The Electrochemical Society. 143 (1996) 3 - p. 1099-1103 , 1996
Link:
https://doi.org/10.1149/1.1836590
RT Journal T1 <Title>Modeling and Characterization of Gas‐Phase Etching of Thermal Oxide and TEOS Oxide Using Anhydrous HF and CH 3 OH</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.1836590&Exemplar=1&LAN=DE A1 Lee, Chun Su A1 Baek, Jong Tae A1 Yoo, Hyung Joun A1 Woo, Seong Ihl PB The Electrochemical Society YR 1996 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 143 IS 3 SP 1099 OP 1103 LK http://dx.doi.org/https://doi.org/10.1149/1.1836590 DO https://doi.org/10.1149/1.1836590 SF ELIB - SuUB Bremen
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