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1 Ergebnisse
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Dielectric Constant and Stability of Fluorine‐Doped Plasma ..:
Lee, Peter W.
;
Mizuno, Shinsuke
;
Verma, Amrita
..
Journal of The Electrochemical Society. 143 (1996) 6 - p. 2015-2019 , 1996
Link:
https://doi.org/10.1149/1.1836941
RT Journal T1 <Title>Dielectric Constant and Stability of Fluorine‐Doped Plasma Enhanced Chemical Vapor Deposited SiO2 Thin Films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.1836941&Exemplar=1&LAN=DE A1 Lee, Peter W. A1 Mizuno, Shinsuke A1 Verma, Amrita A1 Tran, Huyen A1 Nguyen, Bang PB The Electrochemical Society YR 1996 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 143 IS 6 SP 2015 OP 2019 LK http://dx.doi.org/https://doi.org/10.1149/1.1836941 DO https://doi.org/10.1149/1.1836941 SF ELIB - SuUB Bremen
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