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1 Ergebnisse
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Electrochemical Measurements during the Chemical Mechanical..:
Kneer, E. A.
;
Raghunath, C.
;
Mathew, V.
..
Journal of The Electrochemical Society. 144 (1997) 9 - p. 3041-3049 , 1997
Link:
https://doi.org/10.1149/1.1837956
RT Journal T1 <Title>Electrochemical Measurements during the Chemical Mechanical Polishing of Tungsten Thin Films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.1837956&Exemplar=1&LAN=DE A1 Kneer, E. A. A1 Raghunath, C. A1 Mathew, V. A1 Raghavan, S. A1 Jeon, Joong S. PB The Electrochemical Society YR 1997 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 144 IS 9 SP 3041 OP 3049 LK http://dx.doi.org/https://doi.org/10.1149/1.1837956 DO https://doi.org/10.1149/1.1837956 SF ELIB - SuUB Bremen
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