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1 Ergebnisse
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Effect of Deposition Temperature and Sputtering Ambient on ..:
Byun, Jeong Soo
;
Park, Ji‐Soo
;
Kim, Jae Jeong
Journal of The Electrochemical Society. 144 (1997) 9 - p. 3175-3179 , 1997
Link:
https://doi.org/10.1149/1.1837978
RT Journal T1 <Title>Effect of Deposition Temperature and Sputtering Ambient on In Situ Cobalt Silicide Formation</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.1837978&Exemplar=1&LAN=DE A1 Byun, Jeong Soo A1 Park, Ji‐Soo A1 Kim, Jae Jeong PB The Electrochemical Society YR 1997 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 144 IS 9 SP 3175 OP 3179 LK http://dx.doi.org/https://doi.org/10.1149/1.1837978 DO https://doi.org/10.1149/1.1837978 SF ELIB - SuUB Bremen
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