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A Comparative Electrochemical Study of Copper Deposition on..:
Li, G.
;
Kneer, E. A.
;
Vermeire, B.
...
Journal of The Electrochemical Society. 145 (1998) 1 - p. 241-246 , 1998
Link:
https://doi.org/10.1149/1.1838241
RT Journal T1 <Title>A Comparative Electrochemical Study of Copper Deposition onto Silicon from Dilute and Buffered Hydrofluoric Acids</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.1838241&Exemplar=1&LAN=DE A1 Li, G. A1 Kneer, E. A. A1 Vermeire, B. A1 Parks, H. G. A1 Raghavan, S. A1 Jeon, Joong S. PB The Electrochemical Society YR 1998 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 145 IS 1 SP 241 OP 246 LK http://dx.doi.org/https://doi.org/10.1149/1.1838241 DO https://doi.org/10.1149/1.1838241 SF ELIB - SuUB Bremen
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