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Controlled Anodic Oxidation for High Precision Etch Depth i..:
Buda, M.
;
Smalbrugge, E.
;
Geluk, E.‐J.
...
Journal of The Electrochemical Society. 145 (1998) 3 - p. 1076-1079 , 1998
Link:
https://doi.org/10.1149/1.1838392
RT Journal T1 <Title>Controlled Anodic Oxidation for High Precision Etch Depth in AlGaAs III‐V Semiconductor Structures</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.1838392&Exemplar=1&LAN=DE A1 Buda, M. A1 Smalbrugge, E. A1 Geluk, E.‐J. A1 Karouta, F. A1 Acket, G. A. A1 van de Roer, T. G. A1 Kaufmann, L. M. F. PB The Electrochemical Society YR 1998 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 145 IS 3 SP 1076 OP 1079 LK http://dx.doi.org/https://doi.org/10.1149/1.1838392 DO https://doi.org/10.1149/1.1838392 SF ELIB - SuUB Bremen
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