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Investigation of Particle Generation during the Low‐Pressur..:
Rao, N. P.
;
Nijhawan, S.
;
Kim, T.
...
Journal of The Electrochemical Society. 145 (1998) 6 - p. 2051-2057 , 1998
Link:
https://doi.org/10.1149/1.1838596
RT Journal T1 <Title>Investigation of Particle Generation during the Low‐Pressure Chemical Vapor Deposition of Borophosphosilicate Glass Films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.1838596&Exemplar=1&LAN=DE A1 Rao, N. P. A1 Nijhawan, S. A1 Kim, T. A1 Wu, Z. A1 Campbell, S. A1 Kittelson, D. A1 McMurry, P. A1 Cheng, C. C. A1 Mastromatteo, E. PB The Electrochemical Society YR 1998 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 145 IS 6 SP 2051 OP 2057 LK http://dx.doi.org/https://doi.org/10.1149/1.1838596 DO https://doi.org/10.1149/1.1838596 SF ELIB - SuUB Bremen
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