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Analysis of Thin Films in Silicon Integrated Circuit Techno..:
Parekh, N.
;
Nieuwenhuizen, C.
;
Borstrok, J.
.
Journal of The Electrochemical Society. 138 (1991) 5 - p. 1460-1465 , 1991
Link:
https://doi.org/10.1149/1.2085807
RT Journal T1 <Title>Analysis of Thin Films in Silicon Integrated Circuit Technology by X‐Ray Fluorescence Spectrometry</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2085807&Exemplar=1&LAN=DE A1 Parekh, N. A1 Nieuwenhuizen, C. A1 Borstrok, J. A1 Elgersma, O. PB The Electrochemical Society YR 1991 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 138 IS 5 SP 1460 OP 1465 LK http://dx.doi.org/https://doi.org/10.1149/1.2085807 DO https://doi.org/10.1149/1.2085807 SF ELIB - SuUB Bremen
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