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Downstream Plasma Induced Deposition of SiN x on Si, InP , ..:
Dzioba, Steven
;
Meikle, S.
;
Streater, R. W.
Journal of The Electrochemical Society. 134 (1987) 10 - p. 2599-2603 , 1987
Link:
https://doi.org/10.1149/1.2100250
RT Journal T1 <Title>Downstream Plasma Induced Deposition of SiN x on Si, InP , and InGaAs</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2100250&Exemplar=1&LAN=DE A1 Dzioba, Steven A1 Meikle, S. A1 Streater, R. W. PB The Electrochemical Society YR 1987 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 134 IS 10 SP 2599 OP 2603 LK http://dx.doi.org/https://doi.org/10.1149/1.2100250 DO https://doi.org/10.1149/1.2100250 SF ELIB - SuUB Bremen
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