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Oxide Breakdown due to Charge Accumulation during Plasma Et..:
Rydén, K. ‐H.
;
Norström, H.
;
Nender, C.
.
Journal of The Electrochemical Society. 134 (1987) 12 - p. 3113-3118 , 1987
Link:
https://doi.org/10.1149/1.2100351
RT Journal T1 <Title>Oxide Breakdown due to Charge Accumulation during Plasma Etching</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2100351&Exemplar=1&LAN=DE A1 Rydén, K. ‐H. A1 Norström, H. A1 Nender, C. A1 Berg, S. PB The Electrochemical Society YR 1987 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 134 IS 12 SP 3113 OP 3118 LK http://dx.doi.org/https://doi.org/10.1149/1.2100351 DO https://doi.org/10.1149/1.2100351 SF ELIB - SuUB Bremen
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