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The Distribution of Cl Impurities in SiO2 Films Produced by..:
Sheu, Y. ‐D.
;
Butler, S. R.
;
Feigl, F. J.
.
Journal of The Electrochemical Society. 133 (1986) 10 - p. 2136-2140 , 1986
Link:
https://doi.org/10.1149/1.2108356
RT Journal T1 <Title>The Distribution of Cl Impurities in SiO2 Films Produced by Thermal Oxidation of Si in Cl‐Containing Ambients</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2108356&Exemplar=1&LAN=DE A1 Sheu, Y. ‐D. A1 Butler, S. R. A1 Feigl, F. J. A1 Magee, C. W. PB The Electrochemical Society YR 1986 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 133 IS 10 SP 2136 OP 2140 LK http://dx.doi.org/https://doi.org/10.1149/1.2108356 DO https://doi.org/10.1149/1.2108356 SF ELIB - SuUB Bremen
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