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Growth and Physical Properties of LPCVD Polycrystalline SiO..:
Widmer, A. E.
;
Harbeke, G.
;
Krausbauer, L.
.
Journal of The Electrochemical Society. 133 (1986) 9 - p. 1880-1886 , 1986
Link:
https://doi.org/10.1149/1.2109041
RT Journal T1 <Title>Growth and Physical Properties of LPCVD Polycrystalline SiO x Films</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2109041&Exemplar=1&LAN=DE A1 Widmer, A. E. A1 Harbeke, G. A1 Krausbauer, L. A1 Steigmeier, E. F. PB The Electrochemical Society YR 1986 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 133 IS 9 SP 1880 OP 1886 LK http://dx.doi.org/https://doi.org/10.1149/1.2109041 DO https://doi.org/10.1149/1.2109041 SF ELIB - SuUB Bremen
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