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1 Ergebnisse
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Characteristics of the HfO2 Thin Films Grown by Remote Plas..:
Kang, Hyunseok
;
Kim, Seokhoon
;
Kim, Jinwoo
...
ECS Transactions. 1 (2006) 5 - p. 459-464 , 2006
Link:
https://doi.org/10.1149/1.2209296
RT Journal T1
Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2209296&Exemplar=1&LAN=DE A1 Kang, Hyunseok A1 Kim, Seokhoon A1 Kim, Jinwoo A1 Choi, Jihoon A1 Jeon, Hyeongtag A1 Bae, Choelhwyi PB The Electrochemical Society YR 2006 SN 1938-5862 SN 1938-6737 JF ECS Transactions VO 1 IS 5 SP 459 OP 464 LK http://dx.doi.org/https://doi.org/10.1149/1.2209296 DO https://doi.org/10.1149/1.2209296 SF ELIB - SuUB Bremen
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