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Extraction of Kinetic Parameters for the Chemical Vapor Dep..:
Holleman, Jisk
;
Verweij, Jan F.
Journal of The Electrochemical Society. 140 (1993) 7 - p. 2089-2097 , 1993
Link:
https://doi.org/10.1149/1.2220770
RT Journal T1 <Title>Extraction of Kinetic Parameters for the Chemical Vapor Deposition of Polycrystalline Silicon at Medium and Low Pressures</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2220770&Exemplar=1&LAN=DE A1 Holleman, Jisk A1 Verweij, Jan F. PB The Electrochemical Society YR 1993 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 140 IS 7 SP 2089 OP 2097 LK http://dx.doi.org/https://doi.org/10.1149/1.2220770 DO https://doi.org/10.1149/1.2220770 SF ELIB - SuUB Bremen
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