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A New Method for Promoting Photoresist Adhesion on Tungsten..:
Bartram, M. E.
;
Howard, A. J.
;
Baca, A. G.
..
Journal of The Electrochemical Society. 140 (1993) 10 - p. 2998-3001 , 1993
Link:
https://doi.org/10.1149/1.2220946
RT Journal T1 <Title>A New Method for Promoting Photoresist Adhesion on Tungsten Films for Self‐Aligned Refractory Gates on GaAs</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2220946&Exemplar=1&LAN=DE A1 Bartram, M. E. A1 Howard, A. J. A1 Baca, A. G. A1 Shul, R. J. A1 Rieger, D. J. PB The Electrochemical Society YR 1993 SN 0013-4651 SN 1945-7111 JF Journal of The Electrochemical Society VO 140 IS 10 SP 2998 OP 3001 LK http://dx.doi.org/https://doi.org/10.1149/1.2220946 DO https://doi.org/10.1149/1.2220946 SF ELIB - SuUB Bremen
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