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1 Ergebnisse
1
Selective Enhancement of SiO[sub 2] Etch Rate by Ar-Ion Imp..:
Sun, Xin
;
Lu, Qiang
;
Takeuchi, Hideki
..
Electrochemical and Solid-State Letters. 10 (2007) 9 - p. D89 , 2007
Link:
https://doi.org/10.1149/1.2748634
RT Journal T1 <Title>Selective Enhancement of SiO[sub 2] Etch Rate by Ar-Ion Implantation for Improved Etch Depth Control</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2748634&Exemplar=1&LAN=DE A1 Sun, Xin A1 Lu, Qiang A1 Takeuchi, Hideki A1 Balasubramanian, Sriram A1 King Liu, Tsu-Jae PB The Electrochemical Society YR 2007 SN 1099-0062 JF Electrochemical and Solid-State Letters VO 10 IS 9 SP D89 LK http://dx.doi.org/https://doi.org/10.1149/1.2748634 DO https://doi.org/10.1149/1.2748634 SF ELIB - SuUB Bremen
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