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1 Ergebnisse
1
ALD Refill of Nanometer-Scale Gaps with High-κ Dielectric f..:
Lee, Donovan
;
Seidel, Thomas
;
Dalton, Jeremie
.
Electrochemical and Solid-State Letters. 10 (2007) 9 - p. H257 , 2007
Link:
https://doi.org/10.1149/1.2749331
RT Journal T1
ALD Refill of Nanometer-Scale Gaps with High-κ Dielectric for Advanced CMOS Technologies
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2749331&Exemplar=1&LAN=DE A1 Lee, Donovan A1 Seidel, Thomas A1 Dalton, Jeremie A1 King Liu, Tsu-Jae PB The Electrochemical Society YR 2007 SN 1099-0062 JF Electrochemical and Solid-State Letters VO 10 IS 9 SP H257 LK http://dx.doi.org/https://doi.org/10.1149/1.2749331 DO https://doi.org/10.1149/1.2749331 SF ELIB - SuUB Bremen
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