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1 Ergebnisse
1
Effects of SiN[sub x] Passivation and Gate Metal Roughness ..:
Chen, Jian Z.
;
Cherenack, K.
;
Tsay, C.
..
Electrochemical and Solid-State Letters. 11 (2008) 2 - p. H26 , 2008
Link:
https://doi.org/10.1149/1.2812443
RT Journal T1 <Title>Effects of SiN[sub x] Passivation and Gate Metal Roughness on the Performance of On-plastic a-Si:H TFTs</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2812443&Exemplar=1&LAN=DE A1 Chen, Jian Z. A1 Cherenack, K. A1 Tsay, C. A1 Cheng, I-Chun A1 Wagner, Sigurd PB The Electrochemical Society YR 2008 SN 1099-0062 JF Electrochemical and Solid-State Letters VO 11 IS 2 SP H26 LK http://dx.doi.org/https://doi.org/10.1149/1.2812443 DO https://doi.org/10.1149/1.2812443 SF ELIB - SuUB Bremen
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