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1 Ergebnisse
1
Thermal Annealing Effects on the Atomic Layer Deposited LaA..:
Eom, Dail
;
Hwang, Cheol Seong
;
Kim, Hyeong Joon
..
Electrochemical and Solid-State Letters. 11 (2008) 7 - p. G33 , 2008
Link:
https://doi.org/10.1149/1.2916437
RT Journal T1
Thermal Annealing Effects on the Atomic Layer Deposited LaAlO[sub 3] Thin Films on Si Substrate
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2916437&Exemplar=1&LAN=DE A1 Eom, Dail A1 Hwang, Cheol Seong A1 Kim, Hyeong Joon A1 Cho, Mann-Ho A1 Chung, K. B. PB The Electrochemical Society YR 2008 SN 1099-0062 JF Electrochemical and Solid-State Letters VO 11 IS 7 SP G33 LK http://dx.doi.org/https://doi.org/10.1149/1.2916437 DO https://doi.org/10.1149/1.2916437 SF ELIB - SuUB Bremen
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