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The Role of the Methyl and Hydroxyl Groups of Low-k Dielect..:
Heo, Jaeyeong
;
Won, Seok-Jun
;
Eom, Dail
...
Electrochemical and Solid-State Letters. 11 (2008) 8 - p. H210 , 2008
Link:
https://doi.org/10.1149/1.2929064
RT Journal T1 <Title>The Role of the Methyl and Hydroxyl Groups of Low-k Dielectric Films on the Nucleation of Ruthenium by ALD</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2929064&Exemplar=1&LAN=DE A1 Heo, Jaeyeong A1 Won, Seok-Jun A1 Eom, Dail A1 Lee, Sang Young A1 Ahn, Young Bae A1 Hwang, Cheol Seong A1 Kim, Hyeong Joon PB The Electrochemical Society YR 2008 SN 1099-0062 JF Electrochemical and Solid-State Letters VO 11 IS 8 SP H210 LK http://dx.doi.org/https://doi.org/10.1149/1.2929064 DO https://doi.org/10.1149/1.2929064 SF ELIB - SuUB Bremen
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