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1 Ergebnisse
1
High-K Gate Dielectric Structures by Atomic Layer Depositio..:
Clark, Robert D.
;
Consiglio, Steve
;
Wajda, Cory
...
ECS Transactions. 16 (2008) 4 - p. 291-305 , 2008
Link:
https://doi.org/10.1149/1.2980004
RT Journal T1
High-K Gate Dielectric Structures by Atomic Layer Deposition for the 32nm and Beyond Nodes
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2980004&Exemplar=1&LAN=DE A1 Clark, Robert D. A1 Consiglio, Steve A1 Wajda, Cory A1 Leusink, Gert A1 Sugawara, Takuya A1 Nakabayashi, Hajime A1 Jagannathan, Hemanth A1 Edge, Lisa F. A1 Jamison, Paul A1 Paruchuri, Vamsi A1 Iijima, Ryosuke A1 Takayanagi, Mariko A1 Linder, Barry A1 Bruley, J A1 Copel, Matt A1 Narayanan, Vijay PB The Electrochemical Society YR 2008 SN 1938-5862 SN 1938-6737 JF ECS Transactions VO 16 IS 4 SP 291 OP 305 LK http://dx.doi.org/https://doi.org/10.1149/1.2980004 DO https://doi.org/10.1149/1.2980004 SF ELIB - SuUB Bremen
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