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1 Ergebnisse
1
Organic Mask Removal Assessment for 32nm Fully Depleted SOI..:
Lachal, Laurent
;
Chiaroni, Julien
;
Lajoinie, Emile
...
ECS Transactions. 16 (2008) 5 - p. 355-361 , 2008
Link:
https://doi.org/10.1149/1.2981617
RT Journal T1
Organic Mask Removal Assessment for 32nm Fully Depleted SOI Technology with TiN-metal Gate on HfO2
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.2981617&Exemplar=1&LAN=DE A1 Lachal, Laurent A1 Chiaroni, Julien A1 Lajoinie, Emile A1 Louveau, Olivier A1 Ritton, Frederic A1 Lavios, Pascal A1 Finet, Jean-Marc A1 Biranceau, Pierre A1 Arnoux, André A1 Sauvagnargues, Eric A1 Bailloux, Olivier A1 Medico, Gino A1 Tallaron, Christiane A1 Humbert, Franck A1 Rochat, Névine A1 Martinez, Eugenie PB The Electrochemical Society YR 2008 SN 1938-5862 SN 1938-6737 JF ECS Transactions VO 16 IS 5 SP 355 OP 361 LK http://dx.doi.org/https://doi.org/10.1149/1.2981617 DO https://doi.org/10.1149/1.2981617 SF ELIB - SuUB Bremen
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