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Improvement of Adhesion Performances of CVD-W Films Deposit..:
Kim, Choon-Hwan
;
Rho, Il-Cheol
;
Kim, Soo-Hyun
...
Electrochemical and Solid-State Letters. 12 (2009) 3 - p. H80 , 2009
Link:
https://doi.org/10.1149/1.3056376
RT Journal T1 <Title>Improvement of Adhesion Performances of CVD-W Films Deposited on B[sub 2]H[sub 6]-Based ALD-W Nucleation Layer</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.3056376&Exemplar=1&LAN=DE A1 Kim, Choon-Hwan A1 Rho, Il-Cheol A1 Kim, Soo-Hyun A1 Sohn, Yong-Sun A1 Kang, Hyo-Sang A1 Kim, Hyeong-Joon PB The Electrochemical Society YR 2009 SN 1099-0062 JF Electrochemical and Solid-State Letters VO 12 IS 3 SP H80 LK http://dx.doi.org/https://doi.org/10.1149/1.3056376 DO https://doi.org/10.1149/1.3056376 SF ELIB - SuUB Bremen
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