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1 Ergebnisse
1
The Effects of Deposition and Processing Parameters on the ..:
Wilson, Patrick R.
;
Roschuk, Tyler
;
Zalloum, Othman
..
ECS Transactions. 16 (2009) 21 - p. 33-41 , 2009
Link:
https://doi.org/10.1149/1.3100625
RT Journal T1
The Effects of Deposition and Processing Parameters on the Electronic Structure and Photoluminescence from Nitride-Passivated Silicon Nanoclusters
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.3100625&Exemplar=1&LAN=DE A1 Wilson, Patrick R. A1 Roschuk, Tyler A1 Zalloum, Othman A1 Wojcik, Jacek A1 Mascher, P. PB The Electrochemical Society YR 2009 SN 1938-5862 SN 1938-6737 JF ECS Transactions VO 16 IS 21 SP 33 OP 41 LK http://dx.doi.org/https://doi.org/10.1149/1.3100625 DO https://doi.org/10.1149/1.3100625 SF ELIB - SuUB Bremen
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