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1 Ergebnisse
1
65nm Low Power (LP) SOI Technology on High Resistivity (HR)..:
Raynaud, Christine
;
Haendler, Sebastien
;
Guegan, Georges
...
ECS Transactions. 19 (2009) 4 - p. 257-264 , 2009
Link:
https://doi.org/10.1149/1.3117416
RT Journal T1
65nm Low Power (LP) SOI Technology on High Resistivity (HR) Substrate for WLAN and Mmwave SOCs
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.3117416&Exemplar=1&LAN=DE A1 Raynaud, Christine A1 Haendler, Sebastien A1 Guegan, Georges A1 Gianesello, Frederic A1 Martineau, Baudouin A1 Touret, Patricia A1 Planes, Nicolas PB The Electrochemical Society YR 2009 SN 1938-5862 SN 1938-6737 JF ECS Transactions VO 19 IS 4 SP 257 OP 264 LK http://dx.doi.org/https://doi.org/10.1149/1.3117416 DO https://doi.org/10.1149/1.3117416 SF ELIB - SuUB Bremen
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