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1 Ergebnisse
1
Silicon: Carbon Source/Drain Stressors: Integration of a No..:
Koh, Shao Ming
;
Zhou, Wei-Jing
;
Lee, Rinus T. P.
...
ECS Transactions. 25 (2009) 7 - p. 211-216 , 2009
Link:
https://doi.org/10.1149/1.3203958
RT Journal T1
Silicon: Carbon Source/Drain Stressors: Integration of a Novel Nickel Aluminide-Silicide and Post-Solid-Phase-Epitaxy Anneal for Reduced Schottky-Barrier and Leakage
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.3203958&Exemplar=1&LAN=DE A1 Koh, Shao Ming A1 Zhou, Wei-Jing A1 Lee, Rinus T. P. A1 Sinha, Mantavya A1 Ng, Chee-Mang A1 Zhao, Zhiyong A1 Maynard, Helen A1 Variam, Naushad A1 Erokhin, Yuri A1 Samudra, Ganesh A1 Yeo, Yee-Chia PB The Electrochemical Society YR 2009 SN 1938-5862 SN 1938-6737 JF ECS Transactions VO 25 IS 7 SP 211 OP 216 LK http://dx.doi.org/https://doi.org/10.1149/1.3203958 DO https://doi.org/10.1149/1.3203958 SF ELIB - SuUB Bremen
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