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ZrO2 Thin Films Grown on 2D and 3D Silicon Surfaces by DLI-..:
Galicka-Fau, Karolina
;
Andrieux, Michel
;
Legros, Corinne
...
ECS Transactions. 25 (2009) 8 - p. 1121-1128 , 2009
Link:
https://doi.org/10.1149/1.3207715
RT Journal T1
ZrO2 Thin Films Grown on 2D and 3D Silicon Surfaces by DLI-MOCVD for Electronic Devices
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.3207715&Exemplar=1&LAN=DE A1 Galicka-Fau, Karolina A1 Andrieux, Michel A1 Legros, Corinne A1 Herbst-Ghysel, Michaële A1 Gallet, Isabelle A1 Brunet, Magali A1 Scheid, Emmanuel A1 Schamm, Sylvie PB The Electrochemical Society YR 2009 SN 1938-5862 SN 1938-6737 JF ECS Transactions VO 25 IS 8 SP 1121 OP 1128 LK http://dx.doi.org/https://doi.org/10.1149/1.3207715 DO https://doi.org/10.1149/1.3207715 SF ELIB - SuUB Bremen
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