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1 Ergebnisse
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Methodology of ALD HfO2 High-κ Gate Dielectric Optimization..:
Jagannathan, Hemanth
;
Clark, Robert D.
;
Consiglio, Steve
...
ECS Transactions. 33 (2010) 3 - p. 157-164 , 2010
Link:
https://doi.org/10.1149/1.3481602
RT Journal T1
Methodology of ALD HfO2 High-κ Gate Dielectric Optimization by Cyclic Depositions and Anneals
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.3481602&Exemplar=1&LAN=DE A1 Jagannathan, Hemanth A1 Clark, Robert D. A1 Consiglio, Steve A1 Jamison, Paul A1 Linder, Barry A1 Hopstaken, Marinus A1 Leusink, Gert A1 Paruchuri, Vamsi A1 Narayanan, Vijay PB The Electrochemical Society YR 2010 SN 1938-5862 SN 1938-6737 JF ECS Transactions VO 33 IS 3 SP 157 OP 164 LK http://dx.doi.org/https://doi.org/10.1149/1.3481602 DO https://doi.org/10.1149/1.3481602 SF ELIB - SuUB Bremen
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