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1 Ergebnisse
1
High Tensile Stress with Minimal Dopant Diffusion by Low Te..:
Lee, Yao-Jen
;
Lu, Yu-Lun
;
Mu, Zheng-Chang
...
Electrochemical and Solid-State Letters. 14 (2011) 5 - p. H191 , 2011
Link:
https://doi.org/10.1149/1.3536462
RT Journal T1 <Title>High Tensile Stress with Minimal Dopant Diffusion by Low Temperature Microwave Anneal</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_1.3536462&Exemplar=1&LAN=DE A1 Lee, Yao-Jen A1 Lu, Yu-Lun A1 Mu, Zheng-Chang A1 Hsueh, Fu-Kuo A1 Chao, Tien-Sheng A1 Wu, Ching-Yi PB The Electrochemical Society YR 2011 SN 1099-0062 JF Electrochemical and Solid-State Letters VO 14 IS 5 SP H191 LK http://dx.doi.org/https://doi.org/10.1149/1.3536462 DO https://doi.org/10.1149/1.3536462 SF ELIB - SuUB Bremen
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