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Microreplicated Conditioners for Cu Barrier Chemical-Mechan..:
Tseng, Wei-Tsu
;
Rafie, Sana
;
Ticknor, Adam
...
ECS Journal of Solid State Science and Technology. 4 (2015) 11 - p. P5001-P5007 , 2015
Link:
https://doi.org/10.1149/2.0011511jss
RT Journal T1 <Title>Microreplicated Conditioners for Cu Barrier Chemical-Mechanical Planarization (CMP)</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.0011511jss&Exemplar=1&LAN=DE A1 Tseng, Wei-Tsu A1 Rafie, Sana A1 Ticknor, Adam A1 Devarapalli, Vamsi A1 Truong, Connie A1 Majors, Christopher A1 Zabasajja, John A1 Sokol, Jennifer A1 Laraia, Vince A1 Fritz, Matt PB The Electrochemical Society YR 2015 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 4 IS 11 SP P5001 OP P5007 LK http://dx.doi.org/https://doi.org/10.1149/2.0011511jss DO https://doi.org/10.1149/2.0011511jss SF ELIB - SuUB Bremen
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