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1 Ergebnisse
1
Hot Carrier Effect on Gate-Induced Drain Leakage Current in..:
Dai, Chih-Hao
;
Chang, Ting-Chang
;
Chu, Ann-Kuo
...
Electrochemical and Solid-State Letters. 15 (2012) 6 - p. H211 , 2012
Link:
https://doi.org/10.1149/2.001206esl
RT Journal T1
Hot Carrier Effect on Gate-Induced Drain Leakage Current in n-MOSFETs with HfO2∕Ti1-xNx Gate Stacks
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.001206esl&Exemplar=1&LAN=DE A1 Dai, Chih-Hao A1 Chang, Ting-Chang A1 Chu, Ann-Kuo A1 Kuo, Yuan-Jui A1 Ho, Szu-Han A1 Hsieh, Tien-Yu A1 Lo, Wen-Hung A1 Chen, Ching-En A1 Shih, Jou-Miao A1 Chung, Wan-Lin A1 Dai, Bai-Shan A1 Chen, Hua-Mao A1 Xia, Guangrui A1 Cheng, Osbert A1 Huang, Cheng Tung PB The Electrochemical Society YR 2012 SN 1099-0062 JF Electrochemical and Solid-State Letters VO 15 IS 6 SP H211 LK http://dx.doi.org/https://doi.org/10.1149/2.001206esl DO https://doi.org/10.1149/2.001206esl SF ELIB - SuUB Bremen
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