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Large Scale Uniformity of Sputtering Deposited Single- and ..:
Ishihara, Seiya
;
Hibino, Yusuke
;
Sawamoto, Naomi
...
ECS Journal of Solid State Science and Technology. 5 (2016) 11 - p. Q3012-Q3015 , 2016
Link:
https://doi.org/10.1149/2.0031611jss
RT Journal T1 <Title>Large Scale Uniformity of Sputtering Deposited Single- and Few-Layer MoS2Investigated by XPS Multipoint Measurements and Histogram Analysis of Optical Contrast</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.0031611jss&Exemplar=1&LAN=DE A1 Ishihara, Seiya A1 Hibino, Yusuke A1 Sawamoto, Naomi A1 Ohashi, Takumi A1 Matsuura, Kentarou A1 Machida, Hideaki A1 Ishikawa, Masato A1 Wakabayashi, Hitoshi A1 Ogura, Atsushi PB The Electrochemical Society YR 2016 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 5 IS 11 SP Q3012 OP Q3015 LK http://dx.doi.org/https://doi.org/10.1149/2.0031611jss DO https://doi.org/10.1149/2.0031611jss SF ELIB - SuUB Bremen
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