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Atomically Controlled Processing for Dopant Segregation in ..:
Murota, Junichi
;
Yamamoto, Yuji
;
Costina, Ioan
...
ECS Journal of Solid State Science and Technology. 7 (2018) 6 - p. P305-P310 , 2018
Link:
https://doi.org/10.1149/2.0071806jss
RT Journal T1 <Title>Atomically Controlled Processing for Dopant Segregation in CVD Si and Ge Epitaxial Growth</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.0071806jss&Exemplar=1&LAN=DE A1 Murota, Junichi A1 Yamamoto, Yuji A1 Costina, Ioan A1 Tillack, Bernd A1 Thanh, Vinh Le A1 Loo, Roger A1 Caymax, Matty PB The Electrochemical Society YR 2018 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 7 IS 6 SP P305 OP P310 LK http://dx.doi.org/https://doi.org/10.1149/2.0071806jss DO https://doi.org/10.1149/2.0071806jss SF ELIB - SuUB Bremen
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