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1 Ergebnisse
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Post Cleaning for FEOL CMP with Silica and Ceria Slurries:
Tseng, Wei-Tsu
;
Wu, Changhong
;
McCormack, Tim
.
ECS Journal of Solid State Science and Technology. 6 (2017) 10 - p. P718-P722 , 2017
Link:
https://doi.org/10.1149/2.0101710jss
RT Journal T1 <Title>Post Cleaning for FEOL CMP with Silica and Ceria Slurries</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.0101710jss&Exemplar=1&LAN=DE A1 Tseng, Wei-Tsu A1 Wu, Changhong A1 McCormack, Tim A1 Yang, Ji Chul PB The Electrochemical Society YR 2017 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 6 IS 10 SP P718 OP P722 LK http://dx.doi.org/https://doi.org/10.1149/2.0101710jss DO https://doi.org/10.1149/2.0101710jss SF ELIB - SuUB Bremen
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