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Particle Cleaning Technologies to Meet Advanced Semiconduct..:
Okorn-Schmidt, Harald F.
;
Holsteyns, Frank
;
Lippert, Alexander
...
ECS Journal of Solid State Science and Technology. 3 (2013) 1 - p. N3069-N3080 , 2013
Link:
https://doi.org/10.1149/2.011401jss
RT Journal T1 <Title>Particle Cleaning Technologies to Meet Advanced Semiconductor Device Process Requirements</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.011401jss&Exemplar=1&LAN=DE A1 Okorn-Schmidt, Harald F. A1 Holsteyns, Frank A1 Lippert, Alexander A1 Mui, David A1 Kawaguchi, Mark A1 Lechner, Christiane A1 Frommhold, Philipp E. A1 Nowak, Till A1 Reuter, Fabian A1 Piqué, Miquel Banchs A1 Cairós, Carlos A1 Mettin, Robert PB The Electrochemical Society YR 2013 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 3 IS 1 SP N3069 OP N3080 LK http://dx.doi.org/https://doi.org/10.1149/2.011401jss DO https://doi.org/10.1149/2.011401jss SF ELIB - SuUB Bremen
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