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1 Ergebnisse
1
Cryogenic BF2+ Implantation near Amorphization Threshold Do..:
Park, H. H.
;
Todorov, S.
;
Colombeau, B.
..
Electrochemical and Solid-State Letters. 15 (2011) 2 - p. H31-H33 , 2011
Link:
https://doi.org/10.1149/2.013202esl
RT Journal T1 <Title>Cryogenic BF2+ Implantation near Amorphization Threshold Dose for Halo Junctions in Sub-30 nm Device Technologies</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.013202esl&Exemplar=1&LAN=DE A1 Park, H. H. A1 Todorov, S. A1 Colombeau, B. A1 Rodier, D. A1 Decker-Lucke, K. PB The Electrochemical Society YR 2011 SN 1099-0062 SN 1944-8775 JF Electrochemical and Solid-State Letters VO 15 IS 2 SP H31 OP H33 LK http://dx.doi.org/https://doi.org/10.1149/2.013202esl DO https://doi.org/10.1149/2.013202esl SF ELIB - SuUB Bremen
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