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Smart Polishing of Hard-to-Machine Materials with an Innova..:
Doi, Toshiro K.
;
Seshimo, Kiyoshi
;
Yamazaki, Tsutomu
...
ECS Journal of Solid State Science and Technology. 5 (2016) 10 - p. P598-P607 , 2016
Link:
https://doi.org/10.1149/2.0171610jss
RT Journal T1 <Title>Smart Polishing of Hard-to-Machine Materials with an Innovative Dilatancy Pad under High-Pressure, High-Speed, Immersed Condition</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.0171610jss&Exemplar=1&LAN=DE A1 Doi, Toshiro K. A1 Seshimo, Kiyoshi A1 Yamazaki, Tsutomu A1 Ohtsubo, Masanori A1 Ichikawa, Daizo A1 Miyashita, Tadakazu A1 Takagi, Masataka A1 Saeki, Taku A1 Aida, Hideo PB The Electrochemical Society YR 2016 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 5 IS 10 SP P598 OP P607 LK http://dx.doi.org/https://doi.org/10.1149/2.0171610jss DO https://doi.org/10.1149/2.0171610jss SF ELIB - SuUB Bremen
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