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CMP Development for Ru Liner Structures beyond 14nm:
Patlolla, Raghuveer R.
;
Motoyama, Koichi
;
Peethala, Brown
...
ECS Journal of Solid State Science and Technology. 7 (2018) 8 - p. P397-P401 , 2018
Link:
https://doi.org/10.1149/2.0181808jss
RT Journal T1 <Title>CMP Development for Ru Liner Structures beyond 14nm</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.0181808jss&Exemplar=1&LAN=DE A1 Patlolla, Raghuveer R. A1 Motoyama, Koichi A1 Peethala, Brown A1 Standaert, Theodorus A1 Canaperi, Donald A1 Saulnier, Nicole PB The Electrochemical Society YR 2018 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 7 IS 8 SP P397 OP P401 LK http://dx.doi.org/https://doi.org/10.1149/2.0181808jss DO https://doi.org/10.1149/2.0181808jss SF ELIB - SuUB Bremen
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