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Insights into the C Distribution in Si:C/Si:C:P and the Ann..:
Dhayalan, Sathish Kumar
;
Nuytten, Thomas
;
Pourtois, Geoffrey
...
ECS Journal of Solid State Science and Technology. 8 (2019) 4 - p. P209-P216 , 2019
Link:
https://doi.org/10.1149/2.0181903jss
RT Journal T1
Insights into the C Distribution in Si:C/Si:C:P and the Annealing Behavior of Si:C Layers
UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.0181903jss&Exemplar=1&LAN=DE A1 Dhayalan, Sathish Kumar A1 Nuytten, Thomas A1 Pourtois, Geoffrey A1 Simoen, Eddy A1 Pezzoli, Fabio A1 Cinquanta, Eugenio A1 Bonera, Emiliano A1 Loo, Roger A1 Rosseel, Erik A1 Hikavyy, Andriy A1 Shimura, Yosuke A1 Vandervorst, Wilfried PB The Electrochemical Society YR 2019 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 8 IS 4 SP P209 OP P216 LK http://dx.doi.org/https://doi.org/10.1149/2.0181903jss DO https://doi.org/10.1149/2.0181903jss SF ELIB - SuUB Bremen
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