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1 Ergebnisse
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Editors' Choice—Interface Engineering Strategy Utilizing El..:
Joi, Aniruddha
;
Venkatraman, Kailash
;
Tso, Kuang-Chih
...
ECS Journal of Solid State Science and Technology. 8 (2019) 9 - p. P516-P521 , 2019
Link:
https://doi.org/10.1149/2.0181909jss
RT Journal T1 <Title>Editors' Choice—Interface Engineering Strategy Utilizing Electrochemical ALD of Cu-Zn for Enabling Metallization of Sub-10 nm Semiconductor Device Nodes</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.0181909jss&Exemplar=1&LAN=DE A1 Joi, Aniruddha A1 Venkatraman, Kailash A1 Tso, Kuang-Chih A1 Dictus, Dries A1 Dordi, Yezdi A1 Wu, Pu-Wei A1 Pao, Chih-Wen A1 Akolkar, Rohan PB The Electrochemical Society YR 2019 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 8 IS 9 SP P516 OP P521 LK http://dx.doi.org/https://doi.org/10.1149/2.0181909jss DO https://doi.org/10.1149/2.0181909jss SF ELIB - SuUB Bremen
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