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Correlating Removal Rate to Directivity in Copper Chemical ..:
McAllister, Jeffrey
;
Dadashazar, Hossein
;
Sampurno, Yasa
...
ECS Journal of Solid State Science and Technology. 8 (2019) 11 - p. P734-P739 , 2019
Link:
https://doi.org/10.1149/2.0201911jss
RT Journal T1 <Title>Correlating Removal Rate to Directivity in Copper Chemical Mechanical Planarization</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1149_2.0201911jss&Exemplar=1&LAN=DE A1 McAllister, Jeffrey A1 Dadashazar, Hossein A1 Sampurno, Yasa A1 Gyu Kim, Sung A1 Park, Dongyoul A1 Kwon, Heeill A1 Lee, Yongbin A1 Philipossian, Ara PB The Electrochemical Society YR 2019 SN 2162-8769 SN 2162-8777 JF ECS Journal of Solid State Science and Technology VO 8 IS 11 SP P734 OP P739 LK http://dx.doi.org/https://doi.org/10.1149/2.0201911jss DO https://doi.org/10.1149/2.0201911jss SF ELIB - SuUB Bremen
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